T3 Dental Implant

The T3 Dental Implant is designed to deliver aesthetic results through tissue preservation. It features a contemporary hybrid implant design with the following key characteristics:

Primary Stability

Initial Bone-to-Implant Contact is a major contributor to the implant's stability. The specifications of the T3 Implant are held to rigorous tolerances to provide a closely integrated implant-to-osteotomy fit, creating a dental implant system that helps to achieve primary stability.

No Increased Peri-Implantitis Risk

The T3 Implant utilizes the proven Osseotite® Surface technology at the coronal aspect of the implant. In a five-year study, the dual acid-etched surface of the Osseotite Implant presented no increased risk of peri-implantitis or soft-tissue complications versus a machined surface.

Osseointegration

In preclinical studies, the T3 with DCD Surface demonstrated increased integration strength throughout the healing phase as compared to less complex surface topographies.

Contemporary Hybrid Surface

Coarse and fine micron surface features create an average mean surface roughness value of 1.4 μm in the threaded portion of the dental implant. Features include:

• Coarse and fine micron features
• Fine micron features on the dental implant collar
• Option for nano-scale features along the full length of the dental implant

Integrated Platform Switching

Integrated platform switching medializes the implant/abutment junction (IAJ) inward, creating a biologic width between connective tissue and the IAJ, helping to maintain bone levels. Benefits include:

• Reduced crestal bone loss
• Reduction in crestal bone remodeling vs. non platform-switched dental implants

Seal Integrity

A stable, tight implant/abutment interface minimizes abutment micromotion and reduces potential microleakage.